Dielectric Mie voids demonstrated (2023)
A Stuttgart-led team showed that air cavities milled into bulk silicon support resonant optical modes confined mainly in air. They observed resonant confinement down to 265 nanometers in the ultraviolet.
Established Mie voids as a way to use high-index materials at wavelengths where they absorb.
Provided the physical basis for the 2026 focusing metasurface and for UV color printing demonstrations.
The new focusing mirror is a direct application of the void-confinement principle, scaled into a full wavefront-shaping surface.
